Researcher Information
Teacher Information
Affiliation
Academic Background
Career
Academic Society and Social Activity
Qualification
Field of Research
License
Patent
Special Instructions About Experienced Worker
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Author
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Basic information
Name
KOBAYASHI Shin-ichi
Teacher Information
KOBAYASHI Shin-ichi コバヤシ シンイチ 2430297 1583 Iiyama, Atsugi, Kanagawa
Affiliation
TOKYO POLYTECHNIC UNIVERSITY Faculty of Engineering、Department of Engineering、Electrical and Electronics Course Full-Time Teacher
Academic Background
1988-03 Tohoku University Graduation 大学
2003-09 --- Completion 課程 Doctor
Career
 
Academic Society and Social Activity
2015 2015-11 厚木市教育委員会 おもしろ理科実験教室 ENG 講師
2014 2014-11 厚木市教育委員会 おもしろ理科実験教室 ENG 講師
2013 2013-10 厚木市教育委員会 おもしろ理科実験教室 ENG 講師
2012 2012-07 静岡県立富岳館高等学校 出前授業 ENG 講師
2012 2012-03 厚木市教育委員会 おもしろ理科実験教室 ENG 講師
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2011 2012-03 進路企画 1年次進路ガイダンス 職業理解のための説明会 ENG 講師
2011 2012-02 厚木市教育委員会 おもしろ理科実験教室 ENG 講師
2011 2011-11 東京工芸大学 東京工芸大学公開講座 ENG 講師
2010 2010-09 厚木市教育委員会 おもしろ理科実験教室 ENG 講師
2009 2009-12 厚木市教育委員会 おもしろ理科実験教室 ENG 講師
2009 2009-11 さんぽう 中高生のための未来を拓く理工系フェア2009/研究室体験ブース ENG 講師/展示ブース出展
2009 2009-04 さんぽう 進路フェスタ09 in 横浜/研究室体験ブース ENG 講師/展示ブース出展
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Qualification
 
Field of Research
 
License
 
Patent
 
Special Instructions About Experienced Worker
2016 VHFプラズマCVDによるシリコン窒化膜(a-SiNx:H)の形成と保護膜への適用
2016 シリコン上のエピタキシャルゲルマニウム膜の貫通転位密度低減
Other
2017 Initial oxidation characteristics of air-exposed silicon nitride films grown at low substrate temperature using very-high-frequency plasma-enhanced chemical vapor deposition Taiwan Association for Coating and Thin Film Technology (TACT) 台湾 ENG
2016 IR spectroscopic study during air-exposure of silicon nitride films grown at a low substrate temperature using VHF-PECVD ENG
2016 上部Al電極作製時の基板温度上昇がOLEDの動作特性に与える影響 応用物理学会 朱鷺メッセ ENG
2015 In situ IR spectroscopic study during air-exposure of silicon nitride films deposited at a low substrate temperature by PECVD France ENG
2015 ITO陽極からの正孔注入特性改善のためのITOバッファーの検討 ENG
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2014 VHF-PECVDで形成したSiNx膜中の化学結合経時変化(III) 第75回応用物理学会学術講演会、 18p-PB5-9、 北海道大学 ENG
2014 上部電極膜のスパッタ条件が有機EL素子の動作特性に及ぼす影響 ENG
2013 VHF-PECVDで形成したSiNx膜中の化学結合経時変化 ENG
2013 有機EL素子上部電極膜作製のためのスパッタ成膜法の検討 ENG
2013 Chemical Bonding in Silicon Nitride Films Deposited with SiH4 /N2 by Very High-Frequency Plasma-Enhanced Chemical Vapor Deposition USA ENG
2013 VHF-PECVDで形成したSiNx膜中の化学結合経時変化(II) ENG
2012 SiH4+N2ガスを用いたVHF-PECVD法によるSiNx膜の構造変化 ENG
2012 Structural information from IR spectroscopy on a-SiNx:H deposited from SiH4 - N2 gas mixture using VHF-PECVD ENG
2012 SiH4+N2ガスを用いたVHF-PECVD法によるSiNxの膜構造 ENG
2011 SiH4+N2ガスを原料とするVHF-PECVD法によるSiNx低温成膜 ENG
2009 Effect of isochronal hydrogen annealing on surface roughness and threading dislocation density of epitaxial Ge films grown on Si USA ENG
2006 Deposition of Luminescent a-SiNx:H Films with SiH4 - N2 Gas Mixture by VHF-PECVD Using Novel Impedance Matching Method Darwin、 Australia ENG
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Author
 
Academic Theses
2019 Top-emission organic light emitting diode with indium tin oxide topelectrode films deposited by a low-damage facing-target type sputtering method Yoji Yasuda, Shin-ichi Kobayashi, Takayuki Uchida, Yoichi Hoshi. 2020-02 Thin Solid Films Vol.698 137868 ENG
2019 Reactive sputter deposition of WO3 films by using two deposition methods Y. Yasuda, Y. Hoshi, S. Kobayashi, T. Uchida, Y. Sawada, M. Wang, and H. Lei 2019-05 J. Vacuum Science & Technology A Vol. 37 031514 ENG
2016 IR Spectroscopic Study of Silicon Nitride Films Grown at a Low Substrate Temperature Using Very High Frequency Plasma-Enhanced Chemical Vapor Deposition 2016-11 World Journal of Condensed Matter Physics Vol6, No.4 287-293 ENG
2016 Improvement in Luminance Efficiency of Organic Light Emitting Diodes by Suppression of Secondary Electron Bombardment of Substrate during Sputter Deposition of Top Electrode Films D. Hamaguchi, S. Kobayashi, T. Uchida, Y. Sawada, H. Lei, and Y. Hoshi 2016-09 Japanese Jouenal of Applied Physics Voi.55, No.10 106501 ENG
2015 有機EL素子作製のための低ダメージスパッタ堆積法の開発 星 陽一_ 小林 信一_ 内田 孝幸_ 澤田 豊_ 雷 浩 2016-03 J. the Vacuum Society of Japan Vol. 59 59-64 ENG
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2013 Comparative studies on damages to organic layer during the deposition of ITO films by various sputtering methods H. Lei_ M. Wang_ Y. Hoshi_ T. Uchida_ S. Kobayashi_ and Y. Sawada 2013-11 Applied Surface Science 0 389-394 ENG
2010 Electron-Bombardment-Induced Damage to Organic Light Emission Layer H. Lei_ Y. Hoshi_ M. Wang_ T. Uchida_ S. Kobayashi_ and Y. Sawada 2010-04 Jpn. J. Appl. Phys. 0 42103 ENG
2009 Effect of Isochronal Hydrogen Annealing on Surface Roughness and Threading Dislocation Density of Epitaxial Germanium Films Grown on Silicon S. Kobayashi_ Y. Nishi_ and K.C. Saraswat 2010-01 Thin Solid Films 518 S136-S139 ENG
2007 Deposition of Luminescent a-SiNx:H Films with SiH4 - N2 Gas Mixture by VHF-PECVD Using Novel Impedance Matching Method S. Kobayashi_ N. Ohrui_ Y.C. Chao_ T. Aoki_ H. Kobayashi and T. Asakawa. 2007-07 J. Material Science: Materials in Electronics 0 pp.29-32 ENG
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