Design, fabrication, and test of an EUV mask imaging microscope for lithography generations with sub-16 nm half pitch

ENG

M. Toyoda, K. Yamasoe, M. Yanagihara, T. Amano, T. Terasawa, A. Tokimasa,T.Harada, T. Watanabe, H. Kinoshita

2013-01

2013 International Symposium on Extreme Ultraviolet Lithography (Toyama, Japan)

2012