Demonstrating 30-nm Spatial Resolution of Three-Multilayer-Mirror Objective for Extreme Ultraviolet Microscopy: Imaging Test by Observing Lithography Mask

ENG

M. Toyoda, K. Yamasoe, A. Tokimasa, K. Uchida, T. Harada, T. Terasawa, T. Amano, T. Watanabe, M. Yanagihara, H. Kinoshita

2014-09

Appl. Phys. Express

7 (2014)

102502

2014