At-Wavelength Extreme Ultraviolet Lithography Mask Observation Using a High-Magnification Objective with Three Multilayer Mirrors

ENG

M. Toyoda, K. Yamasoe, T. Hatano, M. Yanagihara, A. Tokimasa, T. Harada, T. Watanabe, H. Kinoshit

2012-10

Appl. Phys. Express

5(2012)

112501.

2012