At-Wavelength EUV Lithography Mask Observation Using a High-Magnification Objective with Three Multilayer Mirrors

ENG

M. Toyoda, K. Yamasoe, T. Hatano, M. Yanagihara, A. Tokimasa, T. Harada, T. Watanabe, H. Kinoshita

2012-05

The 56th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (Hawaii, USA)

2012