学術論文
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At-Wavelength EUV Lithography Mask Observation Using a High-Magnification Objective with Three Multilayer Mirrors
３面多層膜ミラーで構成した高倍率対物鏡によるEUVリソグラフィマスクの実波長観察に関する研究
学会発表要旨
M. Toyoda, K. Yamasoe, T. Hatano, M. Yanagihara, A. Tokimasa, T. Harada, T. Watanabe, H. Kinoshita
2012/05
The 56th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (Hawaii, USA)
2012
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