An EUV Mask-imaging Microscope for Lithography Generations with sub-16 nm Half Pitch

ENG

M. Toyoda, K. Yamasoe, K. Uchida, M. Yanagihara, A. Tokimasa, T. Harada, H. Kinoshita, T. Amano, T. Terasawa)

2012-01

25th International Microprocesses and Nanotechnology Conference (Kobe, Japan)

2011