Simulation Analysis of the Characteristics of a High Magnification Imaging Optics for the Observation of Extreme Ultraviolet Lithography Mask to Predict Phase Defect Printability

ENG

T. Terasawa, Y. Arisawa, T. Amano, T. Yamane, H. Watanabe, M. Toyoda, T. Harada, H. Kinoshita

2013-08

Jpn. J.Appl .Phys.

52(2013)

096601

2013