作品・発表
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2017/02
2017/02
学会発表（海外・国際学会）
IR spectroscopic study during air-exposure of silicon nitride films grown at a low substrate temperature using VHF-PECVD
10th International WorkShop on New Group IV Semiconductor Nanoelectronics、 (Research Institute of Electrical Communication、 Tohoku University)
S. Kobayashi
2016
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