作品・発表
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2013/10
学会発表（海外・国際学会）
Chemical Bonding in Silicon Nitride Films Deposited with SiH4 /N2 by Very High-Frequency Plasma-Enhanced Chemical Vapor Deposition
AVS-60: American Vacuum Society 60th International Conference and Exhibition、 TF-ThP12
S. Kobayashi
USA
2013
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